Lithography is a key process in semiconductor manufacturing, used to create intricate patterns on substrates for all types of semiconductor devices including integrated circuits (ICs), LEDs, Power transistors, HEMTs, and MEMS. The process begins with coating a substrate wafer in a light-sensitive material called photoresist. A mask containing the desired circuit pattern is placed over the wafer, and ultraviolet (UV) light is projected through the mask. The areas exposed to light undergo chemical changes in the photoresist, which is then developed to reveal the pattern. This pattern serves as a guide for subsequent processes such as etching or doping, and metallisation the wafer into functional electronic components.
SIMCO is India’s well-established supplier of Step & Scan UV mass production systems. The systems could be employed for design rules covering wavelengths from 220 to 450 nm. Furthermore, we offer Optical Mask Aligners, Laser-beam direct writer systems for the development & manufacturing of VLSI devices, MEMS/Sensors, GaN/GaAs, Solar cells, and Microfluidics, to Advanced Laboratories and Industries.
SIMCO offers expertise and know-how on Lithography Technology by offering its full range from Optical to Laser-based Lithography equipment as well as providing full technical support services based on such advanced equipment. We offer a broad portfolio of field-proven products that include Mask Aligners, UV Exposure systems, and UV Light sources with Nano-Imprint option availability. Our Direct Laser Writer could offer pattern sizes down to 0.5 microns for 300 mm x 300mm substrates/wafers. Due to its high depth of focus, it offers the best performance for thick photo-resisted coated substrates to realize large aspect ratio microstructures (Full application package available on demand).
Apart from Mask Aligners, SIMCO also offers wet etch equipment and Spin Coating solutions. Our spin coaters are known in the industry for their layer thickness precision. Our products are equipped with low-vibration Motors, negligible shaft wobble and high acceleration capability.
